DIDACTIC PLANT SMAR PD3: ADJUSTMENT OF THE PI CONTROLLER PARAMETERS OF A HEATING TANK - Part B

Authors

  • Nathalia Bastos Domingos Federal University of Viçosa
  • Camila Raissa Rodrigues de Morais Federal University of Viçosa
  • José Vitor Nicacio Federal University of Viçosa
  • André Gomes Tôrres Federal University of Viçosa

DOI:

https://doi.org/10.18540/jcecvl3iss3pp476-498

Keywords:

Chemical Processes, PI Controller, Stability.

Abstract

PID control (proportional, integral and derivative) is important to ensure the standardization and safety of various chemical processes in an industry, as well as the quality of its products. This work was carried out in the heating tank of the Smar PD3 didactic plant with the tuning of the PI controller (proportional and integral) and the stability analysis of the control system. With the transfer function of the heating tank for the flow rates of 200, 400, 600 and 1000 L.h-1, the PI controller was tuned for the flow rate of 600 Lh-1 and it was done the validation of the control experimentally in the plant, which showed satisfactory results. For the other flows, the same parameters of the controller were used for the flow of 600 L.h-1, and the roots were calculated by with a program in Matlab®, which proved the validity of the control for all the flows studied.

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Author Biographies

Nathalia Bastos Domingos, Federal University of Viçosa

Departamento de Química

Engenharia Química

Camila Raissa Rodrigues de Morais, Federal University of Viçosa

Departamento de Química

Engenharia Química

José Vitor Nicacio, Federal University of Viçosa

Departamento de Engenharia Agrícola e Ambiental

André Gomes Tôrres, Federal University of Viçosa

Departamento de Engenharia Elétrica

Published

2017-03-07

How to Cite

Domingos, N. B., Morais, C. R. R. de, Nicacio, J. V., & Tôrres, A. G. (2017). DIDACTIC PLANT SMAR PD3: ADJUSTMENT OF THE PI CONTROLLER PARAMETERS OF A HEATING TANK - Part B. The Journal of Engineering and Exact Sciences, 3(3), 476–498. https://doi.org/10.18540/jcecvl3iss3pp476-498

Issue

Section

Simulation, Optimization and Process Control